Numerical Modeling Of Vapor Behavior In Effusion Sources Used In Thin Film Deposition Processes

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Numerical Modeling of Vapor Behavior in Effusion Sources Used in Thin-film Deposition Processes

Author	: Mark J. Pavol
Publisher	:
Total Pages	: 60
Release	: 2002
ISBN-10	: OCLC:54056982
ISBN-13	:
Rating	: 4/5 ( Downloads)

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Book Synopsis Numerical Modeling of Vapor Behavior in Effusion Sources Used in Thin-film Deposition Processes by : Mark J. Pavol

Download or read book Numerical Modeling of Vapor Behavior in Effusion Sources Used in Thin-film Deposition Processes written by Mark J. Pavol and published by . This book was released on 2002 with total page 60 pages. Available in PDF, EPUB and Kindle. Book excerpt:

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