Directed Self Assembly Of Symmetric Block Copolymer With Density Multiplication For Nanopatterning Applications

Download or read book Directed Self-Assembly of Symmetric Block Copolymer with Density Multiplication for Nanopatterning Applications written by Xuanxuan Chen and published by . This book was released on 2017 with total page 141 pages. Available in PDF, EPUB and Kindle. Book excerpt: Block copolymers (BCPs) are a group of fascinating materials that self-assemble into highly uniform nanoscale structures. With precise control of interfacial properties on both interfaces, these nanostructures can be directed to form user-defined periodic patterns. The directed self-assembly (DSA) of BCPs offers a cost-effective solution to complement the conventional lithography with the capability of density multiplication and pattern rectification. This dissertation mainly focuses on the chemoepitaxial DSA of symmetric BCP into line patterns.